Ion-induced damage and amorphization in Si

نویسندگان
چکیده

برای دانلود باید عضویت طلایی داشته باشید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

The mechanism of ion induced amorphization in Si

Damage build up and amorphization in Si, induced by 25 keV Si 5 cluster ions and similar mass Cs ions have been studied using transmission electron microscopy and channeling Rutherford backscattering spectrometry. Amorphization is found to be a nucleation and growth process, under the direct impact mechanism. A transition to a completely amorphized state is indicated at a dose of around 17 eV/a...

متن کامل

Amorphization of Ge and Si nanocrystals embedded in amorphous SiO2 by ion irradiation

M. Backman,1 F. Djurabekova,1,2,* O. H. Pakarinen,1 K. Nordlund,1 L. L. Araujo,3 and M. C. Ridgway3 1Helsinki Institute of Physics and Department of Physics, University of Helsinki, P.O. Box 43, Helsinki FI-00014, Finland 2Arifov Institute of Electronics, Durmon yuli 33, 100125 Tashkent, Uzbekistan 3Department of Electronic Materials Engineering, Research School of Physical Sciences and Enginee...

متن کامل

Amorphization and Solid-Phase Epitaxial Growth of C-Cluster Ion-Implanted Si

Amorphization and solid-phase epitaxial growth were studied in C-cluster ion-implanted Si. C7H7 ions were implanted at a C-equivalent energy of 10 keV to C doses of 0.1 9 10 cm 2 to 8.0 9 10 cm 2 into (001) Si wafers. Transmission electron microscopy revealed a C amorphizing dose of 5.0 9 10 cm . Annealing of amorphized specimens to effect solid-phase epitaxial growth resulted in defect-free gr...

متن کامل

Amorphization of Si using cluster ions

Amorphization process associated with cluster implants has been studied by cross-sectional transmission electron microscopy for P4 cluster implants !5 keV equivalent monomer energy" as a function of dose and compared to that of monomer P implant at the same equivalent energy. Amorphous pockets are formed by the cluster implant at doses of as low as 6!1013 /cm2, and a continuous amorphous layer ...

متن کامل

Amorphization of crystalline Si due to heavy and light ion irradiation

The University Repository is a digital collection of the research output of the University, available on Open Access. Copyright and Moral Rights for the items on this site are retained by the individual author and/or other copyright owners. Users may access full items free of charge; copies of full text items generally can be reproduced, displayed or performed and given to third parties in any ...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

ژورنال

عنوان ژورنال: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

سال: 1991

ISSN: 0168-583X

DOI: 10.1016/0168-583x(91)95238-9